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7. Impedance spectroscopy: theory, experiment, and applications / Eds. E. Barsoukov, J.R. Macdonald. Hoboken: Wiley, 2005. 595 p.
8. McPherson, M. Fermi level pinning in irradiated silicon considered as a relaxation-like semiconductor / M. McPherson // Physica B. 2004. V. 344, 1-4. P. 5257.
9. Krynicki, J. Electronic Properties of Defects Created by 1.6 GeV Argon Ions in Silicon / J. Krynicki, M. Toulemonde, J. C. Muller, E.Siffert // Materials Science and Engineering B2. 1989. P. 105110.
10. Kuhnke, M. Defect generation in crystalline silicon irradiated with high energy particles / M. Kuhnke, E. Fretwurst, G. Lindstoem // Nucl. Instr. and Meth. B. 2002. V. 186. P. 144151.
11. Fleming, F.M. Defect annealing in neutron and ion damaged silicon: Influence of defect clusters and doping / F.M. Fleming, C.H. Seager, E. Bielejec, G. Vizkelethy, D.V. Lang, J.M. Campbell // J. Appl. Phys. 2010. V. 107. P. 0537(1)(12).
12. Hallen, A. Defects distribution in silicon implanted with low doses of MeV ions / A. Hallen, N. Keskitalo // Nucl. Instr. and Meth. B. 2002. V. 186. P. 344348.
13. , .. / .. , .. , .. , .. // . 1996. .30, 11. . 2017 2024.
14. , .. p +- n - / .. , .. , .. // . 1998. . 32, 3.. 359365.
15. , .. / .. , .. , .. // . 1997. . 23, 9. . 7986.
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17. , .. / .. , .. , .. , . // . 1995. . 29, 3. . 543552.
18. , .. a- p+n- / .. , ., , .. , .. // . 1993. . 27, 2. . 205213.
19. Electrical properties of silicon diodes with p + n junctions irradiated with 197Au+26 swift heavy ions / N.A. Poklonski, N.I. Gorbachuk, S.V. Shpakovski, A.V. Petrov, S.B. Lastovskii, D. Fink, A. Wieck // Nucl. Instr. and Meth. B. 2008. V. 266, 23. P. 50075012.
20. , / .. , .. , .. , .. , A. Wieck // . 2010. . 44, 3. . 397401.
21. Impedance and barrier capacitance of silicon diodes implanted with high-energy Xe ions / N.A. Poklonski, N.I. Gorbachuk, S.V. Shpakovski, V.A. Filipenia, S.B. Lastovskii, V.A. Skuratov, A. Wieck, V.P. Markevich // Microelectronics Reliability. 2010. V. 50, 6. P. 813820.
22. , / .. , .. , .. , A. Wieck // . 2010. . 80, 10. . 7482
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