CVD (Chemical Vapour Deposition) , . , , , , , . .
CVD , , : , , , . CVD , , (, , , , .).
CVD , , , , , . . , CVD :
- , 99,99 - 99,999 %;
- ( 100 % ); ;
- .
, CVD, , , (), , . , CVD ( ) . . , , .. , , . , . , . . 5.16 CVD , TiCl4.
. 5.16. TiN
i + 212 → TiCl4.
(iCl4), (2) (NH3), , TiN:
TiCl4 + NH3 + 1/22 → TiN + 41,
. .
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CVD:
2ReCl5 → Re + 5Cl2,
WF6 + 3H2 → W + 6HF,
WF6 + CH4 + H2 → WC + 6HF,
2NbCl5 + 5H2 → 2Nb + 10HCl,
2NbCl5 + CH4 + 1/2H2 → NbC + 5HCl,
2TaCl5 + CH4 + 1/2H2 → TaCC + 5HCl,
2HfCl4 + CH4 → HfC + 4HCl,
HfCl4 + 2BCl3 + 5H2 → HfB2 + 10HCl,
TiCl4 + 2BCl3 + 5H2 → TiB2 + 10HCl,
TiCl4 + NH3 + 1/2H2 → TiN + 4HCl,
TaCl5 + NH3 + H2 → TaN + 5HCl,
ZrCl4 + 2H2O → ZrO2 + 4HCl,
4BCl3 + CH4 + 4H2 → B4N + 12HCl,
BCl + NH3 → BN + 3HCl,
CVD ( , .) : () , , , , . (. 5.17). , , . .
. 5.17. CVD
. , , , 2. . CVD , , . , , 1 (. 5.18) :
3AlCl↔ AlCl3+ 2l,
3AlCl2↔ 2AlCl3+ l.
, . 11 4, ( ), , , 11 112:
113 + 21311,
2113 + 13112.
. 5.18.
:
1 ; 2 ; 3 ; 4 ; 5 ; 6 ;
7 ; 8
2. . . 113 3. . 5 .
:
2SiCl2 SiCl4 + Si,
:
CrI2 Cr +I
. I, l, F.
CVD , . , , . : TaN, HfN, TiC, Hf2, ZrB2, BN, ZrN, TiN, TiB2, SiC, B4C Si3N4.
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6 (. . 673).